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硅片硅料清洗機廣泛應(yīng)用于各行各業(yè)

作者：admin來源：http://www.eriksarni.com/時間：2022-07-08

硅片硅料清洗機技術(shù)的特點是不分處理對象的基材類型，均可進行處理，可實現(xiàn)整體和局部以及復(fù)雜結(jié)構(gòu)的清洗。因此，硅片硅料清洗機被日益廣泛應(yīng)用于各行各業(yè)：

The characteristic of silicon wafer cleaning machine technology is that it can be processed regardless of the substrate type of the processing object, and it can realize the cleaning of the whole, part and complex structure. Therefore, silicon wafer cleaning machines are increasingly widely used in all walks of life:

1、機械行業(yè)：防銹油脂的去除；量具的清洗；機械零部件的除油除銹；發(fā)動機、化油器及汽車零件的清洗；過濾器、濾網(wǎng)的疏通清洗等。

1. Machinery industry: removal of antirust grease; Cleaning of measuring tools; Degreasing and derusting of mechanical parts; Cleaning of engine, carburetor and auto parts; Dredging and cleaning of filters and strainers, etc.

2、表面處理行業(yè)：電鍍前的除油除銹；離子鍍前清洗；磷化處理；清除積炭；清除氧化皮；清除拋光膏；金屬工件表面活化處理等。

2. Surface treatment industry: degreasing and derusting before electroplating; Cleaning before ion plating; Phosphating treatment; Remove carbon deposits; Remove oxide scale; Remove polishing paste; Metal workpiece surface activation treatment, etc.

3、儀器儀表行業(yè)：精密零件的高清潔度裝配前的清洗等。

3. Instrument industry: high definition cleanliness of precision parts, cleaning before assembly, etc.

4、電子行業(yè)：印刷線路板除松香、焊斑；高壓觸點等機械電子零件的清洗等。

4. Electronics industry: except rosin and solder spots on printed circuit boards; Cleaning of mechanical and electronic parts such as high-voltage contacts, etc.

5、醫(yī)療行業(yè)：醫(yī)療器械的清洗、消毒、殺菌、實驗器皿的清洗等。

5. Medical industry: cleaning, disinfection, sterilization of medical devices, cleaning of experimental vessels, etc.

6、半導(dǎo)體行業(yè)：半導(dǎo)體晶片的高清潔度清洗。

6. Semiconductor industry: high definition cleanliness cleaning of semiconductor chips.

7、鐘表首、飾行業(yè)：清除油泥、灰塵、氧化層、拋光膏等。

7. Watch head and decoration industry: remove oil sludge, dust, oxide layer, polishing paste, etc.

8、化學(xué)、生物行業(yè)：實驗器皿的清洗、除垢。

8. Chemical and biological industries: cleaning and descaling of experimental vessels.

9、光學(xué)行業(yè)：光學(xué)器件的除油、除汗、清灰等。

9. Optical industry: oil, sweat and ash removal of optical devices.

10、紡織印染行業(yè)：清洗紡織錠子、噴絲板等。

10. Textile printing and dyeing industry: cleaning textile spindles, spinnerets, etc.

11、石油化工行業(yè)：金屬濾網(wǎng)的清洗疏通、化工容器、交換器的清洗等。

11. Petrochemical Industry: cleaning and dredging of metal filter screen, cleaning of chemical containers and exchangers, etc.
超聲波清洗機生產(chǎn)廠家

硅片硅料清洗機的機理，主要是依靠等離子體中活性粒子的“活化作用”達(dá)到去除物體表面污漬的目的。就反應(yīng)機理來看，等離子體清洗通常包括以下過程：無機氣體被激發(fā)為等離子態(tài)；氣相物質(zhì)被吸附在固體表面；被吸附基團與固體表面分子反應(yīng)生成產(chǎn)物分子；產(chǎn)物分子解析形成氣相；反應(yīng)殘余物脫離表面。

The mechanism of silicon wafer cleaning machine mainly relies on the "activation" of active particles in plasma to remove stains on the surface of objects. In terms of reaction mechanism, plasma cleaning usually includes the following processes: inorganic gas is excited into plasma state; Gaseous substances are adsorbed on the solid surface; The adsorbed group reacts with the solid surface molecules to produce product molecules; The product molecules are resolved to form gas phase; The reaction residue is separated from the surface.

超聲波清洗機生產(chǎn)廠家提醒，硅片硅料清洗機有三種方法：

The manufacturer of ultrasonic cleaning machine reminds that there are three methods for silicon wafer and silicon material cleaning machine:

①刷洗或擦洗：可除去顆粒污染和大多數(shù)粘在片子上的薄膜。

① Brushing or scrubbing: it can remove particle pollution and most of the films stuck on the film.

②高壓清洗：是用液體噴射片子表面，噴嘴的壓力高達(dá)幾百個大氣壓。高壓清洗靠噴射作用，片子不易產(chǎn)生劃痕和損傷。但高壓噴射會產(chǎn)生靜電作用，靠調(diào)節(jié)噴嘴到片子的距離、角度或加入防靜電劑加以避免。

② High pressure cleaning: liquid is used to spray the surface of the sheet, and the pressure of the nozzle is as high as hundreds of atmospheres. High pressure cleaning relies on spray, so the film is not easy to produce scratches and damage. However, high-pressure spray will produce electrostatic effect, which can be avoided by adjusting the distance and angle between the nozzle and the film or adding antistatic agent.

③超聲波清洗：超聲波聲能傳入溶液，靠氣蝕作用洗掉片子上的污染。但是，從有圖形的片子上除去小于1微米顆粒則比較困難。將頻率提高到超高頻頻段，清洗效果更好。

③ Ultrasonic cleaning: ultrasonic energy is transferred into the solution, and the pollution on the film is washed away by cavitation. However, it is difficult to remove particles smaller than 1 micron from the patterned film. The cleaning effect is better when the frequency is increased to ultra-high frequency band.

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